Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications1
This standard is issued under the fixed designation F 1238; the number immediately following the designation indicates the year of original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
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